Nt: Not applicable. Informed Consent Statement: Not applicable. Information Availability Statement: The information presented within this study are available on request from the corresponding author. Acknowledgments: The authors thank Fuqiang Lin for his suggestions in this study. Conflicts of Interest: The authors declare no conflict of interest.
applied sciencesArticleUniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography ProcessGa Eul Kim 1,two, , Hyuntae Kim 1, , Kyoohee Woo 1 , Yousung Kang two , Seung-Hyun Lee 1 , Yongho Jeon two , Moon G. Lee 2, and Sin Kwon 1, Department of Printed Electronics, Nano-Convergence Manufacturing Systems Research Division, Korea Institute Machinery Supplies (KIMM), Daejeon-si 34103, Korea; [email protected] (G.E.K.); [email protected] (H.K.); [email protected] (K.W.); [email protected] (S.-H.L.) Department of Mechanical Engineering, Ajou University, Suwon-si 16499, Korea; [email protected] (Y.K.); [email protected] (Y.J.) Correspondence: [email protected] (M.G.L.); [email protected] (S.K.); Tel.: +82-219-2338 (M.G.L.); +82-42-868-7219 (S.K.) These authors contributed equally to this work.Citation: Kim, G.E.; Kim, H.; Woo, K.; Kang, Y.; Lee, S.-H.; Jeon, Y.; Lee, M.G.; Kwon, S. Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Procedure. Appl. Sci. 2021, 11, 9571. https://doi.org/10.3390/ app11209571 Academic Editor: Arkadiusz Gola Received: 17 September 2021 Accepted: 7 October 2021 Published: 14 OctoberAbstract: We aimed to improve the processing location from the roll-to-roll (R2R) nanoimprint lithography (NIL) approach for higher productivity, utilizing a lengthy roller. It can be typical to get a long roller to possess bending deformation, geometric errors and misalignment. This causes the non-uniformity of Finafloxacin Protocol contact stress between the rollers, which leads to defects such as non-uniform patterning. The non-uniformity in the contact stress from the standard R2R NIL program was investigated by means of finite element (FE) evaluation and experiments in the standard method. To resolve the issue, a new large-area R2R NIL uniform pressing system with 5 multi-backup rollers was proposed and manufactured as an alternative from the standard technique. As a preliminary experiment, the possibility of uniform speak to stress was confirmed by using only the pressure at both ends and one backup roller in the center. A more even contact pressure was accomplished by using all five backup rollers and applying an suitable pushing force to each backup roller. Machine studying techniques had been applied to find the optimal mixture with the pushing forces. Within the conventional pressing method, it was confirmed that pressure deviation from the get in touch with region occurred at a level of 44 ; when the improved system was applied, pressure deviation dropped to five . Search phrases: roller bending; speak to stress; roll-to-roll course of action; nanoimprint lithography; higher productivity1. Introduction Nanoimprint lithography (NIL), which was introduced by Chou in 1995, has been regarded as a promising technologies with outstanding Cholesteryl Linolenate Metabolic Enzyme/Protease advantages. Depending on the mechanical deformation of a curable resist, NIL is really a fabrication technique in which a substrate is coated and a preferred pattern is pressed into the coating to replicate an inverse pattern [1]. Since it tends to make it doable to conveniently replicate patterns working with molds with fine patterns, NIL technology is extremely applicable towards the manufacturing course of action of functional optical devices, semiconductors or displ.
